Difference between conventional anodic oxidation and hard anodic oxidation

Difference between conventional anodic oxidation and hard anodic oxidation

There are the following differences in operation and coating:

Differences in operating conditions are:

1. The temperature of conventional anodic oxidation is about 18-22 ℃, and that with additives can reach 30 ℃. If the temperature is too high, powder or crack will appear easily. The hard anodic oxidation is generally below 5 ℃, and the lower the temperature is, the higher the hard anodic oxidation is.

2. Concentration difference: Conventional anodic oxidation is about 20%, and hard anodic oxidation is generally 15% or less.

3. Current / voltage difference: Conventional anodic oxidation current density: 1-1.5a/dm2; hard anodic oxidation: 1.5-3a/dm2

The differences in film properties are:

1. Film thickness: generally, the thickness of hard anodic oxidation film is more than 15 μm, if the thickness is too low, it will not meet the hardness requirements., while the thickness of conventional anodic oxidation film is relatively thin.

2. Surface state: the conventional anodic oxidation surface is relatively flat, while the hard oxidation surface is relatively rough.

3. Different porosity: conventional anodic oxidation porosity is high, while hard anodic oxidation porosity is low.

4. Different application occasions: conventional anodic oxidation is mainly used for decoration, while hard anodic oxidation is mainly used for function, which is generally used for wear-resistant and electric resistant occasions.